| 产品信息 |
苏州市电子材料厂有限公司 |
产品目录 |
| 序号 |
品名(Product name) |
| 1 |
正性光刻胶 |
Positive Photoresist |
| 2 |
负性光刻胶 |
Negative Photoresists |
| 3 |
正胶剥离液 |
Stripper for Positive Photoresists |
| 4 |
正胶显影液 |
Developer for Positive Photoresists |
| 5 |
负胶显影液 |
Developer for Negative Photoresists |
| 6 |
N-甲基吡咯烷酮 |
n-methyl-2-pyrrolidone |
| 7 |
光刻胶配套试剂 |
|
| 8 |
乙酸丁酯 |
butyl acetate |
| 9 |
丙酮 |
Acetone |
| 10 |
异丙醇 |
Iso propanol |
| 11 |
无水乙醇 |
Ethanol |
| 12 |
丁酮 |
Methyl ethyl ketone |
| 13 |
甲醇 |
Methanol |
| 14 |
甲苯 |
Toluene |
| 15 |
二甲苯 |
Xylene |
| 16 |
磷酸（及磷酸盐） |
Phosphoric acid |
| 17 |
盐酸 |
Hydrochloric acid |
| 18 |
硝酸 |
Nitric acid |
| 19 |
过氧化氢 |
Hydrogen peroxide |
| 20 |
氨水 |
Ammonium hydroxide |
| 21 |
硫酸 |
Sulfuric acid |
| 22 |
氢氟酸 |
Hydrofluoric acid |
| 23 |
混酸 |
Mixed acid |
| 24 |
缓冲氢氟酸 |
BOE |
| 25 |
铝腐蚀液 |
Aluminum etchant |
| 26 |
ITO蚀刻液 |
ITO etchant |
| 27 |
铬蚀刻液 |
Chrominum etchant |
| 28 |
多晶硅蚀刻液 |
Poly-Si etchant |
| 29 |
氟化胺 |
Ammonium fluoride |
| 30 |
冰醋酸 |
Acetic acid,glacial |
| 31 |
氢氧化钠 |
Sodium hydroxide |
| 32 |
氢氧化钾 |
Potassium hydroxide |
| 产品目录下载：DownLoad |
|
| |
| |
|
|
 |
|
Tel:+86 512 65137666
Fax:+86 512 65137555
SEMCO CORPORATION
苏州电子材料集团（有限）公司
9F Administrative Building,NO.1368
Wuzhong Avenue,Wuzhong District
中国苏州市吴中经济开发区吴中大道1368号
综合楼9楼
Suzhou215104 China.
邮编：215104 |
|
| |
|
 | |
